This project focuses on thedevelopment of soft X-ray and extreme ultraviolet (EUV) microscopy and opticalsystems for high-resolution imaging and advanced metrology applications. Our research team aims to design, optimize, and implement optical configurations capableof probing nanoscale structures and material properties beyond the limits ofconventional microscopy.
The work involves the developmentand integration of EUV/soft X-ray optical components, such as zone plates,reflective optics, and coherent illumination systems, combined with advancedimaging techniques including coherent diffractive imaging and computationalmicroscopy. Emphasis is placed on improving spatial resolution, contrastmechanisms, and system stability for quantitative phase and structuralanalysis.
Depending on the applicant'sbackground, the project may include optical design and alignment, simulation ofwave propagation, experimental system construction, data acquisition, and imagereconstruction using physics-based and learning-assisted algorithms. Thedeveloped microscopy platform is expected to contribute to applications insemiconductor metrology, nanofabrication process monitoring, and advancedmaterials characterization.
Type of internship: Master internship, PhD internship
Required educational background: Biomedical engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< correo electrónico eliminado por razones de seguridad >)
The reference code for this position is 2026-INT-057. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
Incomplete applications will not be considered.
The work involves the developmentand integration of EUV/soft X-ray optical components, such as zone plates,reflective optics, and coherent illumination systems, combined with advancedimaging techniques including coherent diffractive imaging and computationalmicroscopy. Emphasis is placed on improving spatial resolution, contrastmechanisms, and system stability for quantitative phase and structuralanalysis.
Depending on the applicant'sbackground, the project may include optical design and alignment, simulation ofwave propagation, experimental system construction, data acquisition, and imagereconstruction using physics-based and learning-assisted algorithms. Thedeveloped microscopy platform is expected to contribute to applications insemiconductor metrology, nanofabrication process monitoring, and advancedmaterials characterization.
Type of internship: Master internship, PhD internship
Required educational background: Biomedical engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< correo electrónico eliminado por razones de seguridad >)
The reference code for this position is 2026-INT-057. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
- resume
- motivation
- current study
Incomplete applications will not be considered.
