Description:
We focus on the development of nanopatterning processes for electronic device applications using innovative lithographic methods. Multilayer patterning based on advanced optical principles is of particular interest for achieving high-speed, large-area nanofabrication. This work aims to understand material characterization during the lithographic process and the associated light-matter interactions. Process optimization is an integral part of the topic to ensure high-quality pattern formation on samples. During the training period, hands-on experience in lithography as well as metrology for optical characterization will be acquired.
Responsibilities:
• Prepare samples and receive training in lithographic patterning processes.
• Perform optical simulations for lithography.
• Support the design and fabrication of metasurfaces.
• Document experimental results and contribute to reports and presentations.
Type of internship: Master internship, PhD internship
Required educational background: Bioscience Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< email supprimé pour raison de sécurité >)
The reference code for this position is 2026-INT-079. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
Incomplete applications will not be considered.
We focus on the development of nanopatterning processes for electronic device applications using innovative lithographic methods. Multilayer patterning based on advanced optical principles is of particular interest for achieving high-speed, large-area nanofabrication. This work aims to understand material characterization during the lithographic process and the associated light-matter interactions. Process optimization is an integral part of the topic to ensure high-quality pattern formation on samples. During the training period, hands-on experience in lithography as well as metrology for optical characterization will be acquired.
Responsibilities:
• Prepare samples and receive training in lithographic patterning processes.
• Perform optical simulations for lithography.
• Support the design and fabrication of metasurfaces.
• Document experimental results and contribute to reports and presentations.
Type of internship: Master internship, PhD internship
Required educational background: Bioscience Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< email supprimé pour raison de sécurité >)
The reference code for this position is 2026-INT-079. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
- resume
- motivation
- current study
Incomplete applications will not be considered.
