Background
Optical Devices such asdiffractive optical elementsand nanophotonic devices require precise fabrication of subwavelengthstructures with high spatial resolution and patterning efficiency. High-speedoptical nano-patterning offers a promising approach for rapidly fabricatingcomplex structures while maintaining precise control over the generatedpatterns.
This project aims to investigate and develop a high-speedoptical nano-patterning approach for the fabrication of advanced opticaldevices. The project will combine various idea on lithographic system with combinationof material characterization metrology and computational methods.
Goal
Development of a high-speed nano-patterning approach formetasurface and optical device fabrication.
Objectives
Responsibilitiesmay include (to be confirmed):
Expected Outcomes
The internship is expected to demonstrate a high-speednano-patterning workflow and evaluate its potential for metasurface and opticaldevice fabrication. The project will provide practical experience in opticalsystem development, nanofabrication, computational pattern generation, andexperimental characterization.
Type of internship: Master internship
Duration: 6-12
Required educational background: Chemistry/Chemical Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< email slettet af sikkerhedsmæssige årsager >)
The reference code for this position is 2026-INT-355. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
Incomplete applications will not be considered.
Optical Devices such asdiffractive optical elementsand nanophotonic devices require precise fabrication of subwavelengthstructures with high spatial resolution and patterning efficiency. High-speedoptical nano-patterning offers a promising approach for rapidly fabricatingcomplex structures while maintaining precise control over the generatedpatterns.
This project aims to investigate and develop a high-speedoptical nano-patterning approach for the fabrication of advanced opticaldevices. The project will combine various idea on lithographic system with combinationof material characterization metrology and computational methods.
Goal
Development of a high-speed nano-patterning approach formetasurface and optical device fabrication.
Objectives
- Develop and configure an optical nano-patterning system.
- Investigate high-speed pattern generation and exposure methods.
- Design and generate nanoscale patterns for metasurfaces and optical devices.
- Characterize the fabricated structures using optical and imaging techniques.
- Investigate the relationship between patterning parameters and device performance.
- Explore computational and machine-learning approaches for pattern optimization.
Responsibilitiesmay include (to be confirmed):
- Nano-pattern generation and computational design
- Experimental fabrication and process optimization
- Preparation of documentation and support for presentations and publications
Expected Outcomes
The internship is expected to demonstrate a high-speednano-patterning workflow and evaluate its potential for metasurface and opticaldevice fabrication. The project will provide practical experience in opticalsystem development, nanofabrication, computational pattern generation, andexperimental characterization.
Type of internship: Master internship
Duration: 6-12
Required educational background: Chemistry/Chemical Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics
Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< email slettet af sikkerhedsmæssige årsager >)
The reference code for this position is 2026-INT-355. Mention this reference code in your application.
Only for self-supporting students.
Applications should include the following information:
- resume
- motivation
- current study
Incomplete applications will not be considered.
