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Soft X-ray/EUV plasma simulation for microscopic metrology

Praktik 25 til 36 måneder

Leuven (Belgium)

Offentliggjort den 2. september 2026

  • Opslagstype

    Praktik 25 til 36 måneder

  • Sted

    Leuven (Belgium)

  • Startdato

    Så hurtigt som muligt

  • Løn

    Oplysninger ikke angivet

  • Hjemmearbejde

    Ikke specificeret

This project aims to explore nonlinear optical phenomena occurring in hot, dense plasmas generated from gas targets using both laser-induced and discharge-produced methods. The research will contribute to fundamental understanding and advancement of plasma-light interaction in extreme conditions, relevant for application of high-resolution microscopy useful for metology, and plasma-based light sources generation. The project will combine literature reviews and simulation work, with a focus on optimizing plasma generation and emission characteristics from gas targets.

Type of internship: Master internship

Required educational background: Nanoscience & Nanotechnology, Physics

Supervising scientist(s): For further information or for application, please contact Hyun-su Kim (< email slettet af sikkerhedsmæssige årsager >)

The reference code for this position is 2026-INT-100. Mention this reference code in your application.

Only for self-supporting students.

Applications should include the following information:
  • resume
  • motivation
  • current study

Incomplete applications will not be considered.

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Uddannelsesniveau

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Funktion

Teknologi

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