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[NanoIC topic] Defect analysis and mechanical modeling of high aspect ratio structure stability

Tesis / Doctorado de 25 a 36 meses

Leuven (Belgium)

Publicado el 2 de septiembre de 2026

  • Contrato

    Tesis / Doctorado de 25 a 36 meses

  • Localización

    Leuven (Belgium)

  • Fecha de inicio

    Lo antes posible

  • Salario

    Información no proporcionada

  • Teletrabajo

    No especificado

As CMOS scaling progresses, increasing structural aspectratio (AR) and decreasing critical dimensions (CD) pose great challenges formechanical stability and defectivity control. High-AR structures are particularlysusceptible to collapse and damage during processing steps such as etching,cleaning, and drying.

High-throughput SEM-based defectivity inspection toolsproduce large image datasets, requiring automated algorithms for defectextraction and statistical analysis. By correlating these results with CD-SEM,X-SEM, and OCD metrology, stability criteria can be defined for various processconditions. This internship/thesis focuses on developing a data-drivendefectivity analysis pipeline to better understand the mechanical stability ofnanostructures under different process conditions.

Required Skills
  • Strong analytical and programming skills
  • Experience with image processing and/orstatistical analysis techniques

Type of internship: Master internship, PhD internship

Duration: >6 month

Required educational background: Physics, Mechanical Engineering, Materials Engineering

Supervising scientist(s): For further information or for application, please contact XiuMei Xu (< correo electrónico eliminado por razones de seguridad >)

The reference code for this position is 2026-INT-076. Mention this reference code in your application.

Only for self-supporting students.

Applications should include the following information:
  • resume
  • motivation
  • current study

Incomplete applications will not be considered.

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